http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018208586-A1

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filingDate 2018-05-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2018-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2018208586-A1
titleOfInvention Wafer level burn-in system
abstract A system for simultaneously burning in, testing and curing all the die on an uncut semiconductor wafer; for establishing electrical connectivity in one-to-one correspondence between each die and a specific current amplifier, for monitoring, displaying, evaluating and recording test parameters in relation to preset parametric limits during a requisite test period; and for shutting down any individual die that exceeds the preset parametric limits. Methods of use and subsystems for raising and lowering a semiconductor wafer in relation to a pin chuck and for controlling wafer temperature by circulating a liquid heat exchange medium through platen assemblies disposed above and below the wafer are also disclosed.
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