| abstract |
One aspect provides a washing agent composition for a substrate for a semiconductor device which exhibits superior washing properties with respect to ceria and can suppress change over time in the solvency of ceria. The present disclosure relates to a washing agent composition for a substrate for a semiconductor device containing, in one aspect, a component A, a component B, a component C, and a component D. Component A: sulfuric acid; component B: ascorbic acid; component C: thiourea and/or dithiothreitol; component D: water |