abstract |
This rinse agent composition for silicon wafers contains: a water-soluble polymer A that has a constituent unit A having a betaine structure; and an aqueous medium. It is preferable that the water-soluble polymer A contains a constituent unit represented by formula (1). It is preferable that the water-soluble polymer additionally contains a constituent unit B represented by formula (2). The weight average molecular weight of the water-soluble polymer A is preferably from 1,000 to 3,000,000 (inclusive). This rinse agent composition for silicon wafers may contain a pH adjusting agent, if necessary. |