| abstract |
The purpose of the present invention is to provide a film-forming composition for forming an undercoat capable of satisfactorily forming a phase separation structure due to directed self-assembly and of forming a pattern having a low residue content and few defects. The present invention provides a film-forming composition characterized by comprising a solvent and a polymer that comprises first repeating units, which each include a crosslinkable group, second repeating units, which are different from the first repeating units, and third repeating units, which are different from the first repeating units and have higher polarity than the second repeating units, and that has, on at least one terminal of the main chain, a structural unit which contains a first group, which interacts with Si-OH, Si-H, or Si-N. It is preferable that the composition should be used for forming an undercoat on the upper-side surface of a substrate having Si-OH, Si-H, or Si-N in the surface layer, the undercoat being for a directed self-assembly film comprising a block copolymer that comprises a block comprising the second repeating units and a block comprising the third repeating units. |