http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018003271-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2017-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e2cf846501de5191624a40418c03b36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_421dd0f7b8a0766ac6945e660bf5c106 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52952b8c410fab9bc4b7afccd4de94f1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57d69c998ba644a25a483999a8d015ba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_beb62a7f52dc2a00054baf6baa8ff77a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24fc1b958be16a1abc66d8bdf424bf85 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d773c26933f47f09f8fae9fcf14edf1 |
| publicationDate | 2018-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2018003271-A1 |
| titleOfInvention | Method for forming pattern, process for producing electronic device, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film |
| abstract | Provided are: a method for forming a pattern using a film of an actinic-ray-sensitive or radiation-sensitive resin composition having excellent water conformability and excellent developability; a process for producing an electronic device; an actinic-ray-sensitive or radiation-sensitive resin composition; and a resist film. The method for forming a pattern comprises: a resist film formation step in which an actinic-ray-sensitive or radiation-sensitive resin composition is used to form, on a substrate, a film of the actinic-ray-sensitive or radiation-sensitive resin composition; an exposure step; and a development step. The actinic-ray-sensitive or radiation-sensitive resin composition comprises resin A, which increases in solubility in alkaline developing solutions by the action of an acid, compound B, which generates an acid upon irradiation with actinic rays or radiation, and resin C and/or a combination of resin C1 with resin C2. |
| priorityDate | 2016-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 75.