http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014235179-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2013-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_898802992cbabd9455d2e28e949dee45 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57d69c998ba644a25a483999a8d015ba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d773c26933f47f09f8fae9fcf14edf1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_084340d0abda575af22997968245fcb9 |
| publicationDate | 2014-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2014235179-A |
| titleOfInvention | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, method for producing electronic device, and electronic device |
| abstract | PROBLEM TO BE SOLVED: To provide a pattern forming method capable of forming a pattern with small line width variation (LWR) and further reduced film slip, actinic ray sensitive or radiation sensitive resin composition and actinic ray which can be suitably used in this method Providing a radiation-sensitive or radiation-sensitive film. Moreover, the manufacturing method and electronic device of an electronic device containing this pattern formation method are provided. An actinic ray-sensitive or radiation-sensitive resin composition comprising a resin whose solubility in an organic solvent is reduced by the action of an acid, a solvent, and a compound that generates a component that forms an ionic bond with a polar group in the resin. A step of forming an actinic ray-sensitive or radiation-sensitive film by coating an object on a substrate, an exposure step of exposing the actinic-ray-sensitive or radiation-sensitive film, and exposure using a developer containing an organic solvent A pattern forming method comprising the step of developing the actinic ray-sensitive or radiation-sensitive film to form a negative pattern. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014238557-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018003271-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2018003271-A1 |
| priorityDate | 2013-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 258.