patent/WO-2017172536-A1

http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017172536-A1

Outgoing Links

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filingDate	2017-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor	http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed67eb9e810edfced5655a3f9490f832 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab8c80dcf598b021eb4563c9979f1958 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21f0d01465f2d2c2cf586c0f5a961975
publicationDate	2017-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber	WO-2017172536-A1
titleOfInvention	Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy
abstract	Described herein are architectures, platforms and methods for acquiring optical emission spectra from an optical emission spectroscopy system by flowing a dry cleaning gas into a plasma processing chamber of the plasma processing system and igniting a plasma in the plasma processing chamber to initiate the waferless dry cleaning process.
isCitedBy	http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11776789-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11569066-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11476145-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11699572-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11476090-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11462388-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11462389-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11508554-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11791138-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11495470-B1
priorityDate	2016-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type	http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 56.