Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c5520dd38cc403678d9f91e0b0ee95fb |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-42364 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7869 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-42372 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78696 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K59-1213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4908 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-088 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66969 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-247 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1251 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-8234 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-49 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823412 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-786 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1225 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78645 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-423 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G09F9-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-49 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-423 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-088 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8234 |
filingDate |
2016-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2641126960ce64ceb87c3320a02f332c |
publicationDate |
2017-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2017065199-A1 |
titleOfInvention |
Semiconductor device and method for manufacturing same |
abstract |
This semiconductor device comprises, on a substrate (10), a first thin film transistor (101) which comprises: an auxiliary gate electrode (12); a first insulating layer (14) that covers the auxiliary gate electrode; a main gate electrode (16) that is formed on the first insulating layer; a second insulating layer (18) that covers the main gate electrode; an oxide semiconductor layer (20) that has a multilayer structure including a first layer (20A) and a second layer (20B) that is arranged on the first layer and has a larger band gap than the first layer; and a first source electrode (22) and a first drain electrode (24). The oxide semiconductor layer (20) comprises: a gate facing region (20g) that overlaps the main gate electrode when viewed from the normal direction of the substrate; a source contact region that is in contact with the first source electrode (22); a drain contact region that is in contact with the first drain electrode; and offset regions (30s, 30d) that are arranged between the gate facing region and the source contact region and/or between the gate facing region and the drain contact region. At least a part of each offset region overlaps the auxiliary gate electrode (12), with the first insulating layer (14) and the second insulating layer (18) being interposed therebetween. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019186798-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7339407-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019046903-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7278365-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11374025-B2 |
priorityDate |
2015-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |