| abstract |
[Problem] To provide a radiation sensitive composition which contains, as a base resin, a siloxane polymer having phenoplast crosslinkability, and which has excellent resolution and is capable of forming a pattern having a desired shape with high accuracy. [Solution] A radiation sensitive composition which contains a photoacid generator and, as a silane, a hydrolyzable silane, a hydrolysis product of the hydrolyzable silane or a partial hydrolysis product of the hydrolyzable silane, and wherein the hydrolyzable silane includes compounds represented by formula (1) and formula (2). (In formula (1), R 1 represents an organic group represented by formula (1-2) and is bonded to a silicon atom by an Si-C bond or an Si-O bond; R 2 represents an organic group; and R 3 represents a hydrolyzable group.) (In formula (2), R 7 represents an organic group represented by formula (2-1) and is bonded to a silicon atom by an Si-C bond; R 8 represents an organic group and is bonded to a silicon atom by an Si-C bond; and R 9 represents a hydrolyzable group.) AA Formula |