http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016084495-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_20d3042eb4ea7c9afd525aa89373349d |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L2205-025 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C39-15 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D161-12 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate | 2015-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87b99267f268944f21d923986e01fb50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e3843cb7eb38f1e6b53464a0e4ce044d |
| publicationDate | 2016-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2016084495-A1 |
| titleOfInvention | Novolac type phenol resin, manufacturing method therefor, photosensitive composition, resist material and coating film |
| abstract | Provided are: a photosensitive composition that has excellent heat resistance, a low absorbance for g-ray, h-ray and i-ray exposure wavelengths, and high sensitivity; a resist material; a coating film thereof; and a novolac type phenol resin suitable for such applications; and manufacturing methods therefor. Specifically, provided is a novolac type phenol resin characterized in that the novolac type phenol resin is obtained by reacting a phenolic trinuclear compound (A) and formaldehyde in the presence of an acid catalyst. The phenolic trinuclear compound (A) comprises: a phenolic trinuclear compound (A1) obtained by a condensation reaction of a dialkyl-substituted phenol and a hydroxyl group-containing aromatic aldehyde; and a phenolic trinuclear compound (A2) obtained by a condensation reaction of a dialkyl-substituted phenol that has alkyl groups at positions 2 and 3, 2 and 5, 3 and 4, or 3 and 5, and an aromatic aldehyde that does not have a hydroxyl group. The molar ratio of the phenolic trinuclear compound (A1) and the phenolic trinuclear compound (A2) is 20:80 to 90:10. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016185865-A1 |
| priorityDate | 2014-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 644.