http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016002825-A1

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filingDate 2015-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5bf46a8cda83693c2a5747965583eb9c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87810d89b72abbf1a692402c10070e01
publicationDate 2016-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2016002825-A1
titleOfInvention Method for producing glass substrate for magnetic disc
abstract In the present invention, in a glass substrate polishing process, the occurrence of protrusions at the outer peripheral ends of the primary surface of the glass substrate is suppressed. In the polishing process for polishing the primary surface of a glass substrate, when the particle size (μm) for free grit contained in a polishing liquid supplied between a polishing pad and the primary surface of the glass substrate is x (x>0), the relative abundance (%) of grit for each particle size (x) is y, and y is a function f(x) of x, there is a maximum value (y 1 ) of y in the domain 0.5 μm ≤ x ≤ 1.0 μm, y 1 is the maximum value of y, and when the particle size corresponding to y 1 is x 1 , the curve y = f(x) in the xy coordinate plane has three inflection points P2 (x 2 , y 2 ), P3 (x 3 , y 3 ) and P4 (x 4 , y 4 ) (where x 1 < x 2 < x 3 < x 4 , y 2 = f(x 2 ), y 3 = f(x 3 ), and y 4 = f(x 4 )) in the region x > x 1 , and the ratio (y lm /y 1 ) of the maximum value (y lm ) of y in the domain x 3 ≤ x ≤ x 4 and y 1 is such that 0.5 ≤ y lm /y 1 < 1.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020128539-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019088209-A1
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11680187-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11214713-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7201639-B2
priorityDate 2014-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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