http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015133379-A1

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filingDate 2015-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59c8ca394e7a8bcbd1a7271ffa99e3db
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publicationDate 2015-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2015133379-A1
titleOfInvention Method for producing group-iii nitride crystal, group-iii nitride crystal, semiconductor device, and device for producing group-iii nitride crystal
abstract By means of a vapor phase growth method, the present invention produces a high-quality group-III nitride crystal that has few defects such as strain, dislocations, and warping and has a large size. This method for producing a group-III nitride crystal includes: a first step for group-III nitride crystal production that produces a first group-III nitride crystal (1003) by means of a liquid phase growth method; and a second step for group-III nitride crystal production that produces a second group-III nitride crystal (1004) on the first crystal (1003) by means of a vapor phase growth method. The method for producing a group-III nitride crystal is characterized in that in the first step for group-III nitride crystal production, the surfaces of a plurality of seed crystals (1003a) of a group-III nitride prepared ahead of time are contacted to an alkali metal melt, the group-III element and nitrogen are caused to react in the alkali metal melt in an atmosphere containing nitrogen, and by means of the growth of the plurality of group-III nitride crystals grown from the plurality of seed crystals (1003a), the plurality of group-III nitride crystals are joined to result in the first crystal (1003).
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priorityDate 2014-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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