| abstract |
The purpose of the present invention is to provide a gas barrier film having excellent gas barrier characteristics. This gas barrier film includes, on at least one surface of a polymer base material, a gas barrier layer in which a first layer including zinc oxide and silicon dioxide and a second layer including a silicon compound are arranged in contact with one another in this order from the polymer base material, wherein the binding energy of the Si 2p orbit at the interface between the first layer and the second layer as measured by X-ray photoelectron spectroscopy is greater than the binding energy of the Si 2p orbit in the first layer and is smaller than the binding energy of the Si 2p orbit in the second layer. |