| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_de094784025e53546f898a3de5a5e393 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2059
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0037 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82B3-00 |
| filingDate |
2014-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4aa1aa868f5d640c5b6724a24a5e10c8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f95075e5c4b4bafef4241c71a7c9e9a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_27300f792f13ec82d661e3239f99a0d2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_514235ccc0ddaaf081c355e51824efb0 |
| publicationDate |
2014-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2014197093-A2 |
| titleOfInvention |
All water-based nanopatterning |
| abstract |
The present application provides novel methods for the fabrication of nanostructures. More specifically, the invention relates to direct electron beam lithography with the use of silk fibroin as "green" resists. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109337892-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109337892-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10464361-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11009792-B2 |
| priorityDate |
2013-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |