| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate |
2013-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a257f797a65c81c8e72518dad968f85f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_075a3a80b789dfad4c9a83d380354072
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86f0a33c356d5d61335189d847330926 |
| publicationDate |
2013-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2013154210-A1 |
| titleOfInvention |
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, electronic device manufacturing method using the same, and electronic device |
| abstract |
There is provided a pattern forming method comprising: (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a weight average molecular weight of 7,000 or more and having (I) a structure containing a group having basicity or capable of decomposing by an action of an acid to increase basicity and (II) a structure being different from the structure (I) and containing a group capable of decomposing by the action of an acid to produce a polar group, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film; and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106292205-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106094439-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106556971-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106556971-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016320703-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10562991-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113912520-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10514604-B2 |
| priorityDate |
2012-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |