| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fabd58ac4ab01e44f17b53635fbc320b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aaffc067902782a0853d687a002b8fb8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_523c01278a80a1bb30944968f5cc382e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-165
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-167
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2013-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_71f9d5a79ef0694630dc1df7382741c5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_06b5a1ffb765a9751d9b01bdd067093d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c1cc8e61e12fc096756c19c3c4657265 |
| publicationDate |
2013-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2013126175-A1 |
| titleOfInvention |
Atomic layer deposition lithography |
| abstract |
Methods and apparatus for performing an atomic layer deposition lithography process are provided in the present disclosure. In one embodiment, a method for forming features on a material layer in a device includes pulsing a first reactant gas mixture to a surface of a substrate disposed in a processing chamber to form a first monolayer of a material layer on the substrate surface, directing an energetic radiation to treat a first region of the first monolayer, and pulsing a second reactant gas mixture to the substrate surface to selectively form a second monolayer on a second region of the first monolayer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017505987-A |
| priorityDate |
2012-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |