patent/WO-2013066067-A1

http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013066067-A1

Outgoing Links

Predicate	Object
assignee	http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cf213be03285a0b93967ae2fd2fd351a
classificationCPCAdditional	http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-344
classificationCPCInventive	http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D161-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D311-86 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D311-96 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D335-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D491-107 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D493-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D495-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-122
classificationIPCInventive	http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D311-86 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G61-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D495-10
filingDate	2012-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor	http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61e0f503da1e61302d621d6ba0a2c77f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d0178cd53167c806dbc7a13c2f2a346c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_053af871d1335648ab59a0629653e401
publicationDate	2013-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber	WO-2013066067-A1
titleOfInvention	Phenol monomer, polymer for forming a resist underlayer film including same, and composition for a resist underlayer film including same
abstract	Disclosed are a phenol monomer, a polymer for forming a resist underlayer film including same, and a composition for a resist underlayer film including same, which are to be used in a semiconductor lithography process. The phenol monomer is represented by chemical formula 1 in claim 1.
isCitedBy	http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10745372-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11137686-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014123102-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11143962-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11243467-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017349564-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018154600-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10377734-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11480877-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9828355-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11572430-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106170737-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11256170-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9809601-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106170737-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015165786-A1
priorityDate	2011-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type	http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate	Subject
isCitedBy	http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007007176-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2219076-A1
isDiscussedBy	http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID68463 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID466559316 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID226405834

Total number of triples: 52.