http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013058386-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ee1c19da359446fb5c4f0458a57b783d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-18 |
| filingDate | 2012-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3562db6e6e050a1b518e3c312438ac58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7246ad63bf973f01fd98c9854a6228ab http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_913a17d468eda3c4ad40d71969b40511 |
| publicationDate | 2013-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2013058386-A1 |
| titleOfInvention | Method for manufacturing ink-repellent agent, negative-type photosensitive resin composition, partition wall, and optical device |
| abstract | Provided are a negative-type photosensitive resin composition, and a method for manufacturing an ink-repellent agent which may be applied to the composition, with which a partition wall may be manufactured with a high level of storage stability, and a high level of ink repellency may be maintained even after ultraviolet / ozone irradiation. Also provided are the partition wall which maintains the high level of ink repellency even after the ultraviolet / ozone irradiation, and an optical device comprising the partition wall with which a white spot phenomenon may be prevented. The present invention relates to the negative-type photosensitive resin composition which contains a solvent (D), a photoinitiator (B), an alkali-soluble resin (A), and an ink-repellent agent (C) configured by a partial hydrolysis condensate manufactured by a method which comprises a process in which an acid is included in a mixture containing a hydrolytic silane compound containing a fluorine-containing hydrolyzed silane compound and an amino group to convert a nitrogen atom into a proton, and a process in which water and an acid catalyst are included in the mixture for a hydrolysis and a condensation reaction; the partition wall which is configured by the hard coating film and configured in a shape which divides a substrate surface into a plurality of partitions; and an optical device which comprises the partition wall. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106465508-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015093415-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9818809-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015190294-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022168829-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016085883-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10067421-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015190294-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015163379-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015163379-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2013115191-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106465508-A |
| priorityDate | 2011-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 37.