| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3625fa7db1eb35e7aa8e07de7dbceb84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_474f38ab219552d2ed9d4893b38c3199
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_052701b6b017cc29faa0fcda1a32632a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e3b2a39b03704a1a91d8c6f36bd6f2ad |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2325-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-143 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J3-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2012-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f6d465394e2b838ecc31e76b7b5464c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee5516a3b56865ac74ea50cf063ebeae
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7fc1a65056861555d6ee75cdfd691ee9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5dd5eb65b050aabe99616ad295f99017 |
| publicationDate |
2012-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2012132676-A1 |
| titleOfInvention |
Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks |
| abstract |
A resist pattern forming method contains: in the following order, (1) forming a resist film by using a negative chemical amplification resist composition containing (A) a polymer compound having a repeating unit represented by formula (1) as defined in the specification, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and (C) a crosslinking agent capable of crosslinking the polymer compound (A) by an action of an acid; (2) exposing the resist film, so as to form an exposed resist film; and (4) developing the exposed resist film by using a developer containing an organic solvent. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104919369-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10011576-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11079680-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017084742-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108351588-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108351588-B |
| priorityDate |
2011-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |