Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ccfee51074117c6961593015b14f0dd9 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
filingDate |
2016-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0395494b4bee19dc67bbebce07eccc6b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4754c1ab8a77544575563188df0d152e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3fe0564317097e7abcb2389a0e4b1a5e |
publicationDate |
2018-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
CN-108351588-A |
titleOfInvention |
High heat resistant resist composition and pattern forming method using same |
abstract |
The present invention provides a highly heat-resistant resist composition and a pattern forming method using the composition. The present invention provides a chemically amplified negative resist composition comprising a specific polymer and a specific cross-linking agent, and which allows formation of a resist pattern with high sensitivity, excellent resolution, and strong heat resistance. |
priorityDate |
2015-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |