| abstract |
[Problem] To provide a composition for forming lithographic resist underlayer films which are usable as hard masks. [Solution] A composition for forming lithographic resist underlayer films, which contains, as silane, a hydrolyzable organosilane, a hydrolyzed product thereof, or a hydrolytic condensate thereof, said silane containing a hydrolyzable organosilane represented by formula (1): [(R 1 ) a Si(R 2 ) (3-a) ] b (R 3 ) [wherein R 3 is a group represented by formula (2), (3) or (4) (wherein at least one of R 4 , R 5 and R 6 is bonded to the Si atom either directly or through a connecting group); R 1 is alkyl, aryl, aralkyl, halogenated alkyl, halogenated aryl, halogenated aralkyl, alkenyl, or an organic group bearing epoxy, acryloyl, methacryloyl, mercapto, amino or cyano, or a combination thereof; and R 2 is alkoxy, acyloxy or a halogen atom]. |