| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3c85a82a3705708795fdc38bef228383
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1971b95ac5bfeec1110b29ea40296e8a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2602-42 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C22-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C25-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D307-77
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C22-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-19
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-07 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C22-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D307-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-19
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C313-04 |
| filingDate |
2011-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1bf1c19bff63cdda0d1dfcfdf643121d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f3b3f1273984de0990c1330c4d041d87 |
| publicationDate |
2012-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2012090959-A1 |
| titleOfInvention |
Radiation-sensitive resin composition and compound |
| abstract |
The purpose of the present invention is to meet the increasing demands on fine patterns in the microfabrication field, including the manufacture of integrated-circuit elements, by providing: a radiation-sensitive resin composition that not only has sufficient basic characteristics such as sensitivity and resolution but also has sufficient MEEF performance; and a compound suitable for said radiation-sensitive resin composition. The present invention is a radiation-sensitive resin composition that contains: a compound (A) that satisfies formula (1) and preferably satisfies formula (2); and a polymer (B) containing a constitutional unit that has an acid-dissociable group. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017095447-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014040405-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014131998-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013174857-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017095445-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015194703-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015141504-A1 |
| priorityDate |
2010-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |