Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-74 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D307-00 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-12 |
filingDate |
2012-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fcb142bcea5ae883356b016617eda596 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_670712e4c98df4c464bc1ac57747e207 |
publicationDate |
2013-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2013174857-A |
titleOfInvention |
Resist composition and salt |
abstract |
Improvement of line edge roughness (LER) in manufacturing a resist pattern. A resist composition comprising a resin that is insoluble or hardly soluble in an aqueous alkali solution and that can be dissolved in an aqueous alkaline solution by the action of an acid, and a salt represented by formula (I). [In Formula (I), Q 1 and Q 2 are each a fluorine atom or a C 1-6 perfluoroalkyl group. L 1 represents a trivalent aliphatic saturated hydrocarbon group having 1 to 30 carbon atoms. Ring W 1 and ring W 2 each represent an aliphatic ring having 3 to 36 carbon atoms. R 1 and R 2 are each a hydroxy group or an alkyl group having 1 to 6 carbon atoms. t1 and t2 are integers of 0 to 2, respectively. ] [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7174638-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019131543-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018058824-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014131998-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015131804-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7124340-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018150295-A |
priorityDate |
2011-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |