| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3195533d845399ac07b8b732bb752d3a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aa1691d9627d6c6fef9207f82972d06f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b16f7c3780b586a8d76fd5cbba2cd475
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c57712feebdf90e1da8da7c775b70777
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D307-93
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0275
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D493-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 |
| filingDate |
2011-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ecce2c178ccf396c138217b7aa4efa53
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa349518266840f9dbb27fa66b30a389
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3d0aa7d9140f517e8fceed896f5d0d3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8e7103c30ce8d5896c59fbeaf71634d |
| publicationDate |
2012-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2012043684-A1 |
| titleOfInvention |
Radio-sensitive resin composition and pattern forming method |
| abstract |
The purpose of the present invention is to provide a radio-sensitive resin composition for use in resist film forming that also sufficiently satisfies not only basic properties such as sensitivity, but also MEEF performance, focal depth, LRW and CDU. The present invention is a radio-sensitive resin composition for use in resist film forming according to a pattern forming method having: (1) a resist film forming step of forming a resist film on a substrate; (2) a light exposure step of exposing the resist to light; (3) a heating step of heating the light exposed resist film at a temperature not to exceed 110°C; and (4) an exposure step of exposing the heated resist film. The radio-sensitive resin composition is characterized in that it [A] contains a polymer having a structural unit (I) shown in formula (1) below and a structural unit (II) shown in formula (2) below. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013125070-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022024673-A1 |
| priorityDate |
2010-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |