| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1c235b7c1889a947aa1bdf4700d6d92b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a0b859cea2a10606acc8665663844159
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0d7e29d377ca71855697e48ae6d0d53e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9920731201eb72fd3db6493f2262a2b3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ccca7ad7a1814082c3bd5d0ed11825da
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a81ec7b8d5964c506e9cc63b3cfe9182
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0733d72d6f47d7827347aa3aa1a988f3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_892011d581887e749c19d6a0a535211a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76849
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6704
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1689
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1872
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-288
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02096
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1642 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 |
| filingDate |
2010-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8e56b8de7b81817af0d4b2e5539a134
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e637548c712636b25a0ff06ad8a34339
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1dd3b0d66fb7b90df8e186ec66d0aea
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f43ae491d3be963f505a245641e3343
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c8ee795c4ac81ddeffe6109646b719ed
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c647e4567c8e8043c8a856f9b7afcb5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60edfd1827cb09e5db9fc9c9c331667c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9bd5c1bee34978bb2eac3c49e4fcd836 |
| publicationDate |
2011-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2011072268-A1 |
| titleOfInvention |
Process to keep substrate surface wet during plating |
| abstract |
Methods and systems for handling a substrate through processes including an integrated electroless deposition process includes processing a surface of the substrate in an electroless deposition module to deposit a layer over conductive features of the substrate using a deposition fluid. The surface of the substrate is then rinsed in the electroless deposition module with a rinsing fluid. The rinsing is controlled to prevent de-wetting of the surface so that a transfer film defined from the rinsing fluid remains coated over the surface of the substrate. The substrate is removed from the electroless deposition module while maintaining the transfer film over the surface of the substrate. The transfer film over the surface of the substrate prevents drying of the surface of the substrate so that the removing is wet. The substrate, once removed from the electroless deposition module, is moved into a post-deposition module while maintaining the transfer film over the surface of the substrate. |
| priorityDate |
2009-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |