| abstract |
A thin film transistor (TFT) matrix for a liquid crystal display (LCD) can be prepared by performing several steps of forming layers, and several steps of partially etching layers. Fluorine and preferably carbonyl fluoride, preferably together with oxygen, N 2 O and/or argon, are used as etching gases. The invention also concerns a gas mixture consisting of F 2 or carbonyl fluoride, N 2 O and optionally argon. |