| abstract |
Provided is a radiation-sensitive resin composition that is a material for a resist coat having a large receding contact angle with an liquid immersion exposure solution, such as water, and is less susceptible to any defects caused by pattern development. The composition contains (A) a polymer that has a repeating unit containing an acid-dissociable group and that becomes alkali-soluble when the above-mentioned acid-dissociable group dissociates, and (B) a radiation-sensitive acid-generating agent. The acid-dissociable group has a structure represented by general formula (1). (In the general formula (1), R1 represents a methyl group, etc., R2 represents a hydrocarbon group that forms a ring structure, R3 represents a fluorine atom, etc., R4 represents a carbon atom, and n1 represents an integer from 1 to 7.) |