| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33a9b3d2e7b7d3727ac987d810bdfc77
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ba872f5ea7219e78c11a9d11c6b5e970
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_41ac7ff6ab574ca3737b892da2ebfe6f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02381
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0262 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4488
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4411
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B25-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4585
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45589 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate |
2009-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d7f44d093cbf098585a94735e96a644
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_299ce88f555dbe84225d904c2de93251 |
| publicationDate |
2010-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2010064470-A1 |
| titleOfInvention |
Film-forming apparatus and film-forming method |
| abstract |
A film-forming apparatus and film-forming method, wherein decrease in the film formation rate due to a by-product gas can be suppressed. The film-forming apparatus for growing a film on the surface of a wafer comprises: a chamber in which a wafer is placed; a gas introduction means for introducing, into the chamber, a substance which reacts on the wafer surface and firmly adheres thereto and a raw material gas which changes into a by-product gas; and a counter-reaction means for reacting the by-product gas and producing a raw material gas within the chamber. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015190020-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170017963-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102133625-B1 |
| priorityDate |
2008-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |