| abstract |
The present invention relates to a novel photosensitive composition comprising a) an organic polymer, b) a photobase generator of structure (1 ), and c) optionally a photoacid generator, ( + A 1 n - O 2 C)-B-(CO 2 n - A 2 n + ) x where A 1 n + and A 2 n + are independently an onium cation, x is an integer greater than or equal to 1, and B is a nonfluorinated hydrocarbon moiety. The photosensitive composition may be used as a photoresist composition or be used as an alkali developable antireflective underlayer coating composition. |