http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009129115-A2

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35
filingDate 2009-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e089fef4e6c5f8c33becc752b97ecf19
publicationDate 2009-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2009129115-A2
titleOfInvention Cylindrical magnetron
abstract A rotatable cylindrical magnetron sputtering device that includes a cathode body defining a magnet receiving chamber and a cylindrical target assembly surrounding the cathode body, wherein the cylindrical target assembly is rotatable around the cathode body. The cylindrical target assembly includes a hollow mandrel and a target portion mounted around and spaced away from the hollow mandrel portion so as to create a space gap between the hollow mandrel and the target portion, wherein the space gap may be greater than 0.002 inch and less than 0.020 inch.
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