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filingDate 2009-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2009-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2009104579-A1
titleOfInvention Plasma discharge device and thin film laminate
abstract Provided are a plasma discharge device that forms thin films of excellent film thickness uniformity and thin film layered products. The plasma discharge device is characterized by the fact that in a plasma discharge device having opposing electrodes consisting of a pair of rotating roll electrodes, a plasma discharge space wherein voltage is applied between the opposing electrodes to generate a plasma discharge, a substrate that passes through the plasma discharge space while being held by said opposing electrodes that consist of roll electrodes, and a process gas supply means that supplies process gas into said plasma discharge space, said process gas is composed of a discharge gas and a thin film-forming gas, said discharge gas contains at least 90 vol% or more of nitrogen gas, and the ratio of the diameters of the above pair of roll electrodes that constitute said opposing electrodes is 1.00:0.55 to 1.00:0.95.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020208152-A1
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