| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1cd0cc87b5c545f4ab3827fd73b2fe8f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f9c2e1af948ed88b1d501e78d99fe780
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b63256a9094d37e0c389bac549e3bb13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d7dc140c0f0e23ee31716201cd1a863d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 |
| filingDate |
2008-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8b3df6a5ee73424e32045fffd41f253
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6e72007155428e8f4fcf63a09c057e44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a2f33971beac0b036e884d8a0a583562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d1d769fe5b9145baee0f435d3dbf7d4 |
| publicationDate |
2009-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2009067354-A1 |
| titleOfInvention |
Photoresist compositions and process for multiple exposures with multiple layer photoresist systems |
| abstract |
A photoresist composition and methods using the photoresist composition in multiple exposure/multiple layer processes. The photoresist composition includes a polymer comprising repeat units having a hydroxyl moiety; a photoacid generator; and a solvent. The polymer when formed on a substrate is substantially insoluble to the solvent after heating to a temperature of about 150 °C or greater. One method includes forming a first photoresist layer (120) on a substrate (110), patternwise exposing the first photoresist layer, forming a second non-photoresist layer on the substrate and patterned first photoresist layer (120A). Another method includes forming a first photoresist layer (120) on a substrate (110), patternwise exposing the first photoresist layer, forming a second photoresist layer (130) on the substrate and patterned first photoresist layer (120A) and patternwise exposing the second photoresist layer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012043866-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012073508-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9034558-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011053643-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011014835-A |
| priorityDate |
2007-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |