http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011053643-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2010-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2e48eef761d322d9c1e7a10a50720c7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d0a8b326043d71e11d7f682758710074 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a7b8b3d1d30054a260d0fa8836823486 |
| publicationDate | 2011-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2011053643-A |
| titleOfInvention | Resist pattern forming method and radiation-sensitive resin composition |
| abstract | In double patterning, a second resist pattern can be formed while retaining a first resist pattern without dissolving the first resist agent in the second resist agent, and further, To provide a method for forming a resist pattern that can suppress fluctuations in the line width of a resist pattern and is suitably employed in an immersion exposure process. A step of forming a first resist pattern on a substrate using a polymer (A1) and a first radiation-sensitive resin composition containing a solvent in which the polymer (A1) is soluble (1). And a second radiation-sensitive resin composition containing an alcohol-based solvent in which the polymer (A2) and the polymer (A2) are soluble on the substrate on which the first resist pattern is formed. And a second resist pattern forming step (2), and the polymer (A1) and the first resist pattern are insoluble in an alcohol solvent. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9023577-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9134611-B2 |
| priorityDate | 2009-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 463.