http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009025283-A1

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filingDate 2008-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4abbcfc099df6d727910a8a062f19faa
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publicationDate 2009-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2009025283-A1
titleOfInvention Novel polyimide resin and photosensitive polyimide resin composition
abstract Disclosed is a novel polyimide resin wherein a reactive group, which is capable of forming a crosslinking point by reacting with a crosslinking agent, is introduced in advance of imidization. A dry film or a photosensitive cover film made from a photosensitive polyimide resin containing the novel polyimide resin can be provided with a relatively low elastic modulus and heat resistance because of the novel polyimide resin. Specifically disclosed is a novel polyimide resin which is obtained by imidizing a diamine component containing an amide group-containing siloxane diamine compound represented by the formula (1) below and an acid dianhydride component containing an aromatic acid dianhydride such as 3,3',4,4'-diphenyl sulfone tetracarboxylic acid dianhydride. In the formula (1), R1 and R2 independently represent an optionally substituted alkylene group; m represents an integer of 1-30; and n represents an integer of 0-20.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5362811-B2
priorityDate 2007-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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