| abstract |
Disclosed is a polishing pad having excellent durability and good adhesion between a polishing layer and a base layer. Specifically disclosed as a first embodiment of the invention is a polishing pad having a polishing layer formed on a base layer, which is characterized in that the polishing layer is composed of a thermosetting polyurethane foam having generally spherical open cells having an average cell diameter of 20-300 μm, that the polyurethane foam contains an isocyanate component and an active hydrogen-containing compound as raw materials, and that the active hydrogen-containing compound contains 30-85% by weight of a high-molecular-weight polyol having 2-4 functional groups and a hydroxyl number of 20-100 mgKOH/g. |