http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101399521-B1

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B7-241
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24
filingDate 2011-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2014-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2014-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101399521-B1
titleOfInvention Polishing pad, method of manufacturing the same, and method of manufacturing a glass substrate
abstract The shape of the edge of the object to be polished after the rough polishing is formed into a wing shape so that the object to be polished after the finish polishing can be made flat including the end portion and the polishing pad And a method for producing the same. In order to achieve this object, in a polishing pad having a polishing layer made of a thermosetting polyurethane foam, the hardness value of the thermosetting polyurethane foam after immersing in water for 24 hours is set to 82 or less at 60 seconds , And the value of the tensile storage elastic modulus E '(30 ° C) at a frequency of 1.6 Hz is expressed by the following equation (1): Y &lt; 5X-150 (1) [In the formula (1), Y is the tensile storage modulus E '(MPa), and X is the hardness value of Asuka C (60 seconds value) after immersing in water for 24 hours).
priorityDate 2010-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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