| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f37f4ff2c8f3ec7c2dd049ff046cc2ac
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_232b4b3901ab911d732432cfc7482151
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_28625fc63ed35c289528cf8ec24d9a02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4633d7e0c23c8b052a4fe556a7e95e8a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2201-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2201-02 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C1-1025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-366 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41C1-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41M5-36 |
| filingDate |
2007-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07d90177658e872f803409b87ae98c08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c6ab5c701b2756dabf571d246d83ddd8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44395bf376df978641ac6cf39aa4f7e6 |
| publicationDate |
2008-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2008046775-A1 |
| titleOfInvention |
Negative working, heat-sensitive lithographic printing plate precursor |
| abstract |
A heat-sensitive negative-working lithographic printing plate precursor comprising: a support having a hydrophilic surface or which is provided with a hydrophilic layer; and an image-recording layer comprising hydrophobic thermoplastic polymer particles, an infrared light absorbing dye and a dye, characterized in that said dye has a specified structure and a most bathochromic light absorption peak between 451 nm and 750 nm. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8221960-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102317075-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011151287-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010093413-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8034538-B2 |
| priorityDate |
2006-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |