| abstract |
A microwave line plasma generation system in which a uniform plasma density can be attained in the plasma processing region. The microwave line plasma generation system comprises a waveguide (1), first and second microwave generation sources (2, 3), a first microwave transmission path (4) connected between the first microwave generation source and the opening on one end side of the waveguide and supplying a microwave into the waveguide, a second microwave transmission path (5) connected between the second microwave generation source and the opening on the other end side of the waveguide and supplying a microwave into the waveguide, transmission path length adjusting means (10, 11) respectively provided in the way of the first and second microwave transmission paths in order to adjust the transmission path length of the microwave transmission path, gas sources (12, 13), and a plasma generation means (16). The plasma generation means (16) has a plasma generation chamber extending in the propagating direction of microwave in the waveguide, and a plasma discharge opening for discharging a plasma generated in the plasma generation chamber in the shape of a line. |