Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_557693319feae9db290ba17454a4ceb1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f0154fba7c7cf4485ef2186a98b32458 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d4ada69388e0a1b68daaf536597c732 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-1545 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-5435 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-1575 |
filingDate |
2007-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da3606dee50a91835acc270f41177bbc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18f1f02785317334429be709d5959058 |
publicationDate |
2008-01-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2008002970-A2 |
titleOfInvention |
Silsesquioxane resin systems with base additives bearing electron-attracting functionalities |
abstract |
A silsesquioxane-based composition that contains (a) silsesquioxane resins that contain HSiO3/2 units and RSiO3/2 units wherein; R is an acid dissociable group, and (b) 7-diethylamino-4-methylcoumarin. The silsesquioxane-based compositions are useful as positive resist compositions in forming patterned features on substrate, particularly useful for multi-layer layer (i.e. bilayer) 193 nm & 157 nm photolithographic applications. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109071576-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109071576-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008046244-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012533674-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009543135-A |
priorityDate |
2006-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |