http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008046244-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-05 |
| filingDate | 2006-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1b9fca2eff37b7301541171e8afd47b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ec445bab0c5a156aba237a0e8e0c2ec http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3fd1bdd5334a22064e14dba6000ffb6 |
| publicationDate | 2008-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008046244-A |
| titleOfInvention | Resist composition and resist pattern forming method |
| abstract | A resist composition and a resist pattern forming method capable of forming a resist pattern having a large EL margin and a good shape are provided. A resist composition comprising a resin component (A) whose alkali solubility is increased by the action of an acid and an acid generator component (B) which generates an acid upon exposure, wherein the resin component (A) comprises: The structural unit (a1) represented by the following general formula (a1) and the following general formula (a2) [in the formula (a2), R 1 is an acid-decomposable group represented by the following general formula (I). . And the acid generator component (B) is a compound represented by the following general formula (b-5) [wherein U ″, V ″, W Each independently represents an onium salt (B1) having an anion moiety represented by: an alkyl group having 1 to 10 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom. A resist composition. [Chemical 1] [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010235862-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102305874-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200003087-A |
| priorityDate | 2006-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 303.