| abstract |
An oxide sinter which comprises zinc oxide as the main component and further contains magnesium; a target obtained by processing the sinter; a transparent conductive film obtained from the target by direct-current sputtering or ion plating which has excellent chemical resistance and a low resistance; and a transparent conductive base. The oxide sinter comprises zinc oxide and magnesium and has a magnesium content of 0.02-0.30 in terms of Mg/(Zn+Mg) atom number ratio. Also provided is the oxide sinter which further contains gallium and/or aluminum in such an amount that the content of these is 0-0.08, excluding 0, in terms of (Ga+Al)/(Zn+Ga+Al) atom number ratio and the content of magnesium is 0.02-0.30 in terms of Mg/(Zn+Ga+Al+Mg) atom number ratio. The target is obtained by processing any of these oxide sinters. The transparent conductive film is formed from this target on a substrate by sputtering or ion plating. |