| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44ff3005508304394801e265e503b811
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_22067792c4026e880643f3666df668bb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5b1fa9389efb809e7a97da3fd2a35db9 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-54 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-80 |
| filingDate |
2007-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ae00bc20830a4d81defd123f6325cdea
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca8bd83ddbbafd1fd670a1678e125dfb |
| publicationDate |
2007-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2007099910-A1 |
| titleOfInvention |
Photomask blank and photomask, and their manufacturing method |
| abstract |
Provided are a photomask blank and a photomask, which can form a pattern of a shading film having an excellent sectional shape by optimizing the wet etching characteristics of the shading film, and which can form a pattern of a shading film having extremely small jaggies. The photomask blank having the shading film on a transparent substrate is provided for a wet etching treatment exemplifying a mask by a mask pattern formed on the shading film. This wet etching treatment matches a photomask manufacturing method for patterning the shading film. This shading film is made of a material containing chromium, and has a crystal size of 10 nm or less, as calculated from a diffraction peak of CrN(200) by an X-ray diffraction. The shading film is patterned by the wet etching treatment, to produce a photomask having the shading film pattern on the substrate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020261986-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7154626-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7113724-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008203373-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6855645-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021089422-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019117376-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016105158-A |
| priorityDate |
2006-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |