http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008203373-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-54
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filingDate 2007-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0eb57022dddda119b462c556ec491bee
publicationDate 2008-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2008203373-A
titleOfInvention Halftone blanks and method for producing halftone blanks
abstract PROBLEM TO BE SOLVED: To provide a halftone blank capable of easily manufacturing a halftone mask having a halftone characteristic not dependent on a wavelength. A translucent film 2, an etching stopper film 3, and a light shielding film 4 are sequentially formed on a transparent substrate 1. The etching stopper film 3 prevents the etching from proceeding to the semi-transmissive film 2 when the light shielding film 4 is etched. The light shielding film 4 and the semi-transmissive film 2 are films made of chromium. The semi-transmissive film 2 is formed with a thickness smaller than that of the light-shielding film 4 so as to obtain a predetermined semi-transmissive characteristic for performing halftone exposure. The semipermeable membrane 2 is formed by sputtering a chromium target in a mixed gas atmosphere of 50% argon and 50% carbon dioxide. [Selection] Figure 1
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