| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_81cfb88d909c75104c0c8d61799a72b0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3379f6e68149da494283a507734564e6 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-3409
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02074 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K23-52 |
| filingDate |
2007-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d4fcc66110113979e5b83af389eed7a9 |
| publicationDate |
2007-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2007092800-A2 |
| titleOfInvention |
Low ph post-cmp residue removal composition and method of use |
| abstract |
An acidic composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The acidic composition includes surfactant, dispersing agent, sulfonic acid-containing hydrocarbon, and water. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9074170-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2843034-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3588535-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9831088-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11560533-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8338350-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8685909-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9528078-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009298940-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-RE46427-E
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8765653-B2 |
| priorityDate |
2006-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |