| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_81cfb88d909c75104c0c8d61799a72b0 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-267
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3281
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3209
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-0078
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-0084
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-0073 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32 |
| filingDate |
2014-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_daa8dd0117d55d6889e7fad72859a351
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2623587b0399e5c66ab3f9b6e44162a3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aeb0d4ad6ffb45a801c21421c86b4399
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f3b217c01c37c09fdf8a41d5655cb4c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c12196d284e283c534ccdeaead939ae0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de4a6d60991645fc02a94e6fb1745f68 |
| publicationDate |
2016-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9528078-B2 |
| titleOfInvention |
Antioxidants for post-CMP cleaning formulations |
| abstract |
An cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions include novel corrosion inhibitors. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10319605-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017096624-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9920287-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015337245-A1 |
| priorityDate |
2006-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |