| abstract |
Disclosed is a sputtering target which is characterized by being a sintered body of an oxide which contains at least indium, tin and zinc and includes a spinel structure compound expressed as Zn2SnO4 and a bixbite structure compound expressed as In2O3. Also disclosed is a sputtering target which is characterized in that it contains indium, tin, zinc and oxygen and only a peak ascribed to a bixbite structure compound is practically observed by x-ray diffraction (XRD). |