Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_31227af0dacfa97fc5dc1b0caa1e3d6c http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d669af06cb2abbcd6823699582a97002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_77286f5b0e385c906c2d953ff154913f http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_332b4b3fa970c2117e6459ad6dc72c0e |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-546 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-182 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C10-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02532 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C10-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02422 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02628 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02601 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0368 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-021 |
filingDate |
2006-05-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1aaeae9b6e97dd3a1406a0a23c20f22b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1cfc35f3ff4919d008048ba81c6236e7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a821c27a564030edc76e92412e8abfd8 |
publicationDate |
2006-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2006122877-A1 |
titleOfInvention |
Dispersion containing silicon powder and coating process |
abstract |
Dispersion containing silicon powder and a liquid phase, in which the silicon powder is predominantly in crystalline form and the particles in the dispersion have a mean diameter D50 of less than 500 nm and a BET surface area of more than 5 m2/g. Process for coating a substrate with a nanosize silicon layer having a thickness of from 1 nm to 5 μm using the dispersion. Process for coating a substrate with a closed, polycrystalline silicon layer by means of aluminium-induced layer exchange, in which a dispersion containing nanosize silicon powder is firstly applied to the surface of an aluminium-coated substrate and, after drying of the nanosize silicon layer, the layer structure composed of substrate, aluminium and nanosize silicon powder is thermally treated in an inert atmosphere at a temperature below the eutectic temperature of the mixture of silicon and aluminium. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102007014608-B4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102006024490-A1 |
priorityDate |
2005-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |