| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9087628e8fbdb29ed276be4b57299835
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b3e337665e62946a0d61374ad5c16283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_45ec3eaf85f812540004517d0c97265e |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-55 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C215-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02197
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-55
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31691
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-40 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F15-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C215-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-822
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-04 |
| filingDate |
2005-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5290c0e560a93b6d84d0f4b7872cd93
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9596c1f8cb82fbd46373fdd094f93250 |
| publicationDate |
2006-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2006043418-A1 |
| titleOfInvention |
Alkoxide compound, thin film-forming material and method for forming thin film |
| abstract |
Disclosed is an alkoxide compound represented by the general formula (I) below. The alkoxide compound is an iron compound which can be transported in the liquid state and is easily vaporized due to its high vapor pressure. Such an alkoxide compound realizes thin film production with excellent composition controllability, and thus is suitable for production of a multicomponent thin film using a CVD method. (In the formula (I), R1 and R2 independently represent a hydrogen atom or an alkyl group having 1-4 carbon atoms; R3 and R4 respectively represent an alkyl group having 1-4 carbon atoms; and A represents an alkanediyl group having 1-8 carbon atoms.) |
| priorityDate |
2004-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |