| abstract |
A resist polymer (Y') which contains a polymer (Y) comprising constituent units (A) having lactone skeletons, constituent units (B) having acid-dissociable groups, constituent units (C) having hydrophilic groups, and constituent units (E) having structure represented by general formula (1) and which has a content of the units (E) of 0.3 % by mole or above based on the sum total of the constituent units of the polymer (Y'): (1) [wherein L is a divalent straight-chain, branched, or cyclic C1-20 hydrocarbon group which may have a substituent and/or a heteroatom; R11 is a g-valent straight-chain, branched, or cyclic C1-20 hydrocarbon group which may have a substituent and/or a heteroatom; and g is an integer of 1 to 24]. The resist polymer (Y') can be used as the resist resin in DUV excimer laser lithography, electron beam lithography, and so on. |