| abstract |
PROBLEM TO BE SOLVED: To provide a chemically amplified resist having high transparency to radiation, excellent basic properties as a resist such as dry etching resistance, sensitivity, resolution, pattern shape, etc., and developing defects during fine processing. Provided is a radiation-sensitive resin composition capable of producing a semiconductor device with a high yield without causing a problem. SOLUTION: The radiation-sensitive resin composition comprises (A) a skeleton represented by the following structural formula (1), preferably represented by the following structural formula (2-1) or (2-2). As a group, a resin containing an alkali-insoluble or poorly alkali-soluble acid-dissociable group, which becomes alkali-soluble when the acid-dissociable group is dissociated, and (B) a radiation-sensitive acid generator. The component (A) is represented by a copolymer or the like comprising each repeating unit represented by the following formula (3). Embedded image Embedded image Embedded image |